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Scanning laser lithography with constrained quadratic exposure optimization
- Fleming, Andrew J., Ghalehbeygi, Omid T., Routley, Ben S., Wills, Adrian G.
Erratum: investigation of the photochemistry of the poly {p-phenylenevinylene} precursor system: implications for nanolithography [J. Chem. Phys. 126, 174703 (2007)]
- Cotton, D. V., Fell, C. J., Belcher, W. J., Tachiya, M., Dastoor, P. C.
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